世界最高效的原子力显微镜性能的新标杆
Dimension FastScan System Configuration: (1) Acoustic and Vibration Isolation Enclosure; (2) Scanners; (3) Ultra-Stable High-Resonance Microscope Base; (4) 30” Monitor and FastScan NanoScope Software; (5) Computer; (6) NanoScope V, Stage Controller and H |
·对所有AFM样品提供终极性能测量
·更快的呈现高质量数据
·提供定量的纳米材料性能图谱
·由创新的峰值力模式实现
Dimension FastScan™ 原子力显微镜 (AFM)在不损失Dimension® Icon®超高的分辨率和卓越的仪器性能前提下,最大限度的提高了成像速度。这项突破性的技术创新,从根本上解决了AFM成像速度慢的难题,大大缩短了各技术水平的AFM用户获得数据的时间。
为提高AFM使用效率和检测性能,Bruker开发了这套快速扫描系统,不降低分辨率,不增加操作复杂性,不影响仪器使用成本的前提下,帮助用户实现了利用Dimension快速扫描系统,即快速得到高分辨高质量AFM图像的愿望。当您对样品进行扫描时,无论设置实验参数为扫描速度 > 125Hz,还是在大气下或者溶液中1秒获得一张AFM图像,都能得到优异的高分辨图像。快速扫描这一变革性的技术创新重新定义了AFM仪器的操作和功能。
卓越的仪器检测性能
·在空气或液体中成像速度是原来速度的100倍,自动激光调节和检测器调节,智能进针,大大缩短了实验时间。
·自动测量软件和高速扫描系统完美结合,大幅提高了实验数据的可信度和可重复性。
无与伦比的测量分辨率
·Fastscan精确的力控制模式提高了图像分辨率的同时,延长了探针的使用寿命。
·扫描速度20Hz时仍能获得高质量的TappingModeTM图像,扫描速度6Hz仍能获得高质量的ScanAsyst图像。
·低噪音,温度补偿传感器展现出亚埃级的噪音水平。
全面的测试功能,适用于各类AFM样品
·闭环控制的Icon和FastScan的扫描器极大的降低了Z方向噪音,使它们Z方向的噪音水平分别低于30pm和40 pm,具有超低的热漂移率,可得到超高分辨的真实图像。
·Fast Scan可以对不同样品进行测量,保证扫描过程中从埃级到0.1μm的高精度无失真扫描。
不论您选择Icon扫描器获得超低噪音和超高分辨率的图像,还是选择Dimension FastScan AFM的扫描器进行高速扫描检测,Dimension FastScan AFM系统都会帮助您将仪器的功能开发到最大程度,实现其它单一模式的仪器所达不到的效果。
技术参数:
Parameter | Icon AFM Scanner | FastScan AFM Scanner |
X-Y scan range X-Y方向扫描范围 | 90µm x 90µm typical, 85µm minimum 90µm × 90µm 典型值,最小85µm | 35μm x 35μm typical, 30μm minimum 35µm × 35µm 典型值,最小30µm |
Z range Z方向扫描范围 | 10µm typical in imaging and force curve modes, 9.5µm minimum 在成像及力曲线模式下典型值为10μm;最小9.5μm | ≥3μm |
Vertical noise floor 垂直方向噪音基底 | <30pm RMS in appropriate environment typical imaging BW (up to 625Hz) <30pmRMS, 在合适的环境及典型的成像带宽(达到625Hz) | < 40pm RMS, sensor in appropriate environment (up to 625Hz) < 40pmRMS, 在合适的环境(达到625Hz) |
X-Y tip-velocity max. (1% tracking error) | >2mm/Sec | |
Z tip-velocity max. | 12mm/Sec | |
X-Y position noise (closed-loop) X-Y定位噪音(闭环) | ≤0.15nm RMS typical imaging BW (up to 625Hz) ≤0.15nm RMS,典型成像带宽(达到625Hz) | ≤0.20nm RMS typical imaging BW (up to 2.5kHz in Adaptive) ≤0.20nm RMS,典型成像带宽(达到625Hz) |
X-Y position noise (open-loop) X-Y定位噪音(开环) | ≤0.10nm RMS typical imaging BW (up to 625Hz) ≤0.10nm RMS,典型成像带宽(达到625Hz) | |
Z sensor noise level (closed-loop) Z传感器噪音水平(闭环) | 35pm RMS typical imaging BW (up to 625Hz); 50pm RMS, force curve BW (0.1Hz to 5kHz) 35pm RMS,典型成像带宽(达到625Hz); 50pm RMS,力曲线成像带宽(0.1Hz to 5kHz) | 30pm RMS typical imaging BW (up to 625Hz) 30pm RMS,典型成像带宽(达到625Hz) |
Integral nonlinearity(X-Y-Z) 整体线性误差(X-Y-Z) | <0.5% typical <0.5% 典型值 | ≤0.5% typical ≤0.5% 典型值 |
Sample size/holder 样品尺寸/夹具 | 210mm vacuum chuck for samples, ≤210mm diameter, ≤15mm thick 210mm 真空吸盘样品台;夹具,直径 ≤210mm, 厚度 ≤15mm | |
Motorized position stage (X-Y axis) 电动定位样品台(X-Y轴) | 180mm × 150mm inspectable area; (180mm × 150mm可视区域;) 2µm repeatability, unidirectional; (单向2um重复性;) 3µm repeatability, bidirectional (双向3um重复性) | |
Microscope optics 显微镜光学系统 | 5-megapixel digital camera; 180µm to 1465µm viewing area; Digital zoom and motorized focus 五百万像素数字照相机; 180 µm 至 1465 µm 可视范围; 数字缩放及自动对焦功能 | 5-megapixel digital camera; 130µm to 1040µm viewing area; Digital zoom and motorized focus 五百万像素数字照相机; 130 µm 至 1040 µm 可视范围; 数字缩放及自动对焦功能 |
Controller 控制器 | NanoScope V / NanoScope v8.15 and later NanoScope V型控制器 | |
Workstation 工作站 | Integrates all controllers and provides ergonomic design with immediate physical and visual access 整合所有控制器、结合人体工学设计,提供直接的物理或可视接口 | |
Vibration and Acoustic isolation 振动隔绝 与 声音隔绝 | Integrated, refer to installation requirements for additional information | |
AFM modes AFM模式 | Standard: ScanAsyst, PeakForce Tapping, TappingMode (air), Contact Mode, Lateral Force Microscopy, PhaseImaging, Lift Mode, MFM, Force Spectroscopy, Force Volume, EFM, Surface Potential, Piezoresponse Microscopy, Force Spectroscopy; Optional: PeakForce QNM, HarmoniX, Nanoindentation, Nanomanipulation, Nanolithograpy, Force Modulation (air/fluid), TappingMode (fluid), Torsional Resonance Mode, Dark Lift, STM, SCM, C-AFM, SSRM, PeakForce TUNA,TUNA, TR-TUNA, VITA | Standard: ScanAsyst, Nanomechanical Mapping, TappingMode (air), TappingMode (fluid), PhaseImaging, Contact Mode, Lateral Force Microscopy, Lift Mode, MFM, EFM, Force Spectroscopy, Force Volume Optional: Nanoindentation, Nanomanipulation, Nanolithograpy, Surface Potential, Piezoresponse Microscopy |
Certification 认证 | CE |